Fabrication and evaluation of HfO<sub>2</sub>/Ge structure using Kr/O<sub>2</sub> plasma oxidation method

Presentation information

Oral presentation

13 Semiconductors » 13.3 Insulator technology

Fri. Sep 21, 2018 1:15 PM - 5:00 PM 145 (Reception Hall)

Keisuke Yamamoto(Kyushu Univ.), Yasushi Hotta(Univ. of Hyogo)

2:15 PM - 2:30 PM

〇(M1)Takeshi Tokorozuki¹, Yoshitaka Iwazaki¹, Tomo Ueno¹ (1.TUAT)

Keywords:germanium