[21p-145-1~14] 13.3 Insulator technology

[21p-145-9] Impact of Short-Range-Order in Amorphous Structure on the Dipole Layer Formation at Oxide Hetero-interfaces

〇Shota Kanemaru¹, Okuto Takahashi¹, Marc Perea¹, Motohiro Tomita¹, Takanobu Watanabe¹ (1.Waseda Univ.)

Keywords:high-k, dipole, simulation