2018年第79回応用物理学会秋季学術講演会

講演情報

一般セッション(口頭講演)

6 薄膜・表面 » 6.2 カーボン系薄膜

[21p-232-1~18] 6.2 カーボン系薄膜

2018年9月21日(金) 13:15 〜 18:00 232 (232)

徳田 規夫(金沢大)、鈴木 真理子(コーンズテクノロジー)、竹内 大輔(産総研)、宮崎 久生(東芝)

14:15 〜 14:30

[21p-232-5] Atomistic simulation of Ti-Diamond contact

Manoharan Muruganathan1、Hiroshi Mizuta1,2 (1.JAIST、2.Hitachi Cam Lab)

キーワード:Diamond, Ti-Diamond contact

Diamond has the outstanding physical properties such as wide band gap, high breakdown field, and high thermal conductivity. Due to these unique characteristics, it is being well explored for high power as well as high temperature semiconductor devices [1]. In general, metal-semiconductor contacts play a vital role in the semiconductor device technology. The microscopic details of metal-diamond contact are crucial to understand the complex physics of the diamond devices. Till now most of the reported theoretical study of metal-diamond contact are based on the device level models. In this research work, we report the atomistic simulation of Ti-diamond contact device based on density functional theory (DFT) and nonequilibrium Green’s function (NEGF) formalism.