[21p-PB1-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[21p-PB1-6] Development of rotational double magnetron sputtering device for effective target utilization

〇(M2)Yutarou Nakamura¹, Rei Tanaka¹, Ohtsu Yasunori¹ (1.Saga Univ.)

Keywords:sputtering, magnetron plasma