Takashi Onaya

→ Search for Takashi Onaya in Google Scholar

Speaker, Author, Co-Author

Sat. Mar 17, 2018 1:45 PM - 6:15 PM F206 (61-206)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[17p-F206-1~17] 13.3 Insulator technology

5:30 PM - 5:45 PM

△ [17p-F206-15] Improvement in ferroelectricity of Hf_xZr₁_−xO₂ thin films using top- and bottom-ZrO₂ nucleation layers

〇(M2)Takashi Onaya^1,2, Toshihide Nabatame^2,3, Naomi Sawamoto¹, Akihiko Ohi², Naoki Ikeda², Toyohiro Chikyow², Atsushi Ogura¹ (1.Meiji Univ., 2.NIMS, 3.CREST, JST)