Haruo Sudo

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Speaker, Author, Co-Author

Sun. Mar 18, 2018 1:15 PM - 7:30 PM D103 (56-103)

Oral presentation
| 15 Crystal Engineering
| 15.7 Crystal characterization, impurities and crystal defects

[18p-D103-1~23] 15.7 Crystal characterization, impurities and crystal defects

2:30 PM - 2:45 PM

[18p-D103-6] Formation behavior of oxygen precipitates in ultra-high temperature RTP wafers

〇Haruo Sudo¹, Hideyuki Okamura¹, Susumu Maeda¹, Tatsuhiko Aoki¹, Kozo Nakamura³, Koji Sueoka² (1.Base Technology, Technology, GlobalWafers Japan Co., Ltd., 2.Faculty of Computer Science and System Engineering, Okayama Prefectural Univ., 3.Regional Cooperative Research Organization, Okayama Prefectural Univ.)

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