Noorprajuda Marsetio

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Speaker, Author, Co-Author

Sun. Mar 18, 2018 1:15 PM - 7:30 PM E202 (57-202)

Oral presentation
| 15 Crystal Engineering
| 15.4 III-V-group nitride crystals

[18p-E202-1~22] 15.4 III-V-group nitride crystals

4:00 PM - 4:15 PM

▲ [18p-E202-10] Thickness Dependence on Crystalline Quality and Residual Stresses of AlN Films Deposited by Pulsed DC Reactive Sputtering

〇(D)Noorprajuda Marsetio¹, Makoto Ohtsuka¹, Masayoshi Adachi¹, Hiroyuki Fukuyama¹ (1.Tohoku University)