5:45 PM - 6:00 PM
△ [19p-C202-15] Deposition of high-k dielectrics on 2D channel by PO2 controlled thermal evaporation
〇Kohei Maruyama1, Kosuke Nagashio1,2 (1.The Univ. of Tokyo, 2.JST-PRESTO)
Mon. Mar 19, 2018 1:45 PM - 6:30 PM C202 (52-202)
5:45 PM - 6:00 PM
〇Kohei Maruyama1, Kosuke Nagashio1,2 (1.The Univ. of Tokyo, 2.JST-PRESTO)