Takashi Hamano

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Speaker, Author, Co-Author

Mon. Mar 19, 2018 1:45 PM - 6:15 PM C204 (52-204)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[19p-C204-1~17] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:15 PM - 5:30 PM

[19p-C204-14] Model Predictions of Capacitance-Voltage (C-V) Characteristic of Plasma Process-Damaged Si Substrate

〇Takashi Hamano¹, Yoshinori Nakakubo¹, Koji Eriguchi¹ (1.Kyoto Univ.)