Yuichiro Kimoto

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Speaker, Author, Co-Author

Tue. Mar 20, 2018 9:00 AM - 12:15 PM C204 (52-204)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-C204-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

11:30 AM - 11:45 AM

△ [20a-C204-10] Study on the low temperature and highly efficient deposition process of Silicon Oxide Gate Dielectric layers Using Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition

〇Yuichiro Kimoto¹, Koji Terawaki¹, Hiroshi Yamasaki¹, Takeshi Maekawa¹, Hiromasa Ohmi¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹ (1.Osaka Univ.)