1:15 PM - 1:30 PM △ [20p-D103-1] Relationship between interface defect density and grown wet-oxide thickness in 4H-SiC MOS structure fabricated with low-temperature wet-oxidation after interface nitridation 〇Ryota Sakuta1, Mizuki Nishida1, Hihohisa Hirai1, Koji Kita1 (1.Tokyo Univ.)