Shogo Fukami

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Speaker, Author, Co-Author

Tue. Mar 20, 2018 1:30 PM - 3:45 PM F214 (61-214)

Oral presentation
| 15 Crystal Engineering
| 15.5 Group IV crystals and alloys

[20p-F214-1~9] 15.5 Group IV crystals and alloys

3:30 PM - 3:45 PM

[20p-F214-9] Epitaxial growth of SiGe layer on Si substrate by printing and firing of Al-Ge mixed paste

〇(M1)Shogo Fukami¹, Shota Masuda¹, Yoshihiko Nakagawa¹, Kazuhiro Gotoh¹, Yasuyoshi Kurokawa¹, Marwan Dhamrin², Noritaka Usami¹ (1.Nagoya Univ., 2.Toyo Aluminium)

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