1:30 PM - 3:30 PM
[20p-P6-14] InAlN/AlN/GaN HEMT Grown on 200 mm Si Substrate by Fast Rotating Single-Wafer MOCVD Tool
〇Masayuki Tsukui1, Hajime Nago1, Kiyotaka Miyano1, Yasushi Iyechika1, Hideshi Takahashi1 (1.NuFlare Technology)
Tue. Mar 20, 2018 1:30 PM - 3:30 PM P6 (P)
1:30 PM - 3:30 PM
〇Masayuki Tsukui1, Hajime Nago1, Kiyotaka Miyano1, Yasushi Iyechika1, Hideshi Takahashi1 (1.NuFlare Technology)