Oral presentation
21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"
Mon. Mar 19, 2018 10:00 AM - 11:45 AM E201 (57-201)
Junichi Nomoto(Kochi Univ. of Tech.), Toshihiro Miyata(Kanazawa Inst. of Tech.)
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10:00 AM - 10:15 AM
〇Housei Akazawa1 (1.NTT DIC)
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10:15 AM - 10:30 AM
〇Toshihiro Miyata1, Hiroki Tokunaga1, Tadatsugu Minami1 (1.Kanazawa Inst.)
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10:30 AM - 10:45 AM
〇Michitaka Fukumoto1, Shoichiro Nakao1, Yasushi Hirose1, Tetsuya Hasegawa1 (1.Univ. of Tokyo)
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10:45 AM - 11:00 AM
〇(DC)Akane Samizo1, Naoto Kikuchi1,2, Yoshihiro Aiura2, Keishi Nishio1 (1.Tokyo univ. of Sci., 2.AIST)
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11:00 AM - 11:15 AM
〇(M2)Mian Wei1, Anup Sanchela2, Bin Feng3, Joonhyuk Lee4, Gowoon Kim4, Hyoung Jeen4, Yuichi Ikuhara3, Hiromichi Ohta1,2 (1.IST-Hokkaido Univ., 2.RIES-Hokkaido Univ., 3.Univ. Tokyo, 4.Pusan Natl Univ.)
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11:15 AM - 11:30 AM
〇(P)ANUPKUMAR VINODRAY SANCHELA1, Mian Wei2, Bin Feng3, Joonhyuk Lee4, Goowon Kim4, HyoungJeen Jeen4, Yuichi Ikuhara3, Hiromichi Ohta1,2 (1.RIES-Hokkaido Univ., 2.IST-Hokkaido Univ., 3.Univ. Tokyo, 4.Pusan Natl Univ.)
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11:30 AM - 11:45 AM
〇Tetsuya Yamamoto1, Keisuke Kobayashi1,2, Eiji Kobayashi3, Junichi Nomoto1, Hisao Makino1, Masaaki Kobata2, Yuji Saito2, Shinichi Fujimori2, Tetsuo Okane2, Hiroshi Yamagami2 (1.Kochi Univ. Tech., 2.JAEA, 3.Choshu Ind. Co. Ltd.)
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