The 65h JSAP Spring Meeting, 2018

Presentation information

Oral presentation

13 Semiconductors » 13.3 Insulator technology

[17a-F206-1~13] 13.3 Insulator technology

Sat. Mar 17, 2018 9:00 AM - 12:30 PM F206 (61-206)

Masao Inoue(Renesas), Takanobu Watanabe(Waseda Univ.)

10:45 AM - 11:00 AM

[17a-F206-8] Heat treatment in liquid water at 80oC used to improve the interface characteristic of metal-oxide-semiconductor capacitor

Yoshito Hirokawa1, Masahiko Hasumi1, Toshiyuki Samesima1, Tomohisa Mizuno2 (1.TUAT, 2.Kanagawa Univ.)

Keywords:Metal-Oxide-Semiconductor capacitor, Passivation of silicon surface