The 65h JSAP Spring Meeting, 2018

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[17p-C204-1~20] 8.1 Plasma production and diagnostics

Sat. Mar 17, 2018 1:15 PM - 6:30 PM C204 (52-204)

Kentaro Tomita(Kyushu Univ.)

2:30 PM - 2:45 PM

[17p-C204-6] Pulse-power and discharge-mode dependences for plasma emissions generated by high-power pulsed magnetron sputtering (HPPMS)

〇(B)Hiroshi Nishida1, Koichi Matsuda1, Tomonori Syoji1, Bizi Ichikawa1, Takumi Oshiro1, Masaomi Sanekata1, Hiroaki Yamamoto2, Masahide Tona2, Keizo Tsukamoto2, Motoyoshi Nakano3, Keijiro Ohshimo3, Fuminori Misaizu3 (1.Tokyo Polytechnic Univ., 2.Ayabo Corp, 3.Tohoku Univ.)

Keywords:magnetron sputtering, plasma diagnostics, optical measurement

Emission spectra of plasma generated direct current magnetron sputtering (dcMS) and high-power pulsed magnetron sputtering (HPPMS) were measured in the range of 0.3 to 0.7 kW with the interval of 0.1 kW by using of the HPPMS apparatus for hard-coating processing.
For the same discharge power, the difference emission spectra between HPPMS and dcMS
show the dominant wavelength region for luminescent species: Ti+ ion and Ti atom. The results are discussed in relation to the electronic structures of the luminescent species.