[17p-C204-1~20] 8.1 Plasma production and diagnostics

△ [17p-C204-7] Behavior of ion in high power impulse magnetron sputtering plasma using carbon target

〇(M1)Kazunori Iga¹, Akinori Oda², Hiroyuki Kousaka³, Takayuki Ohta¹ (1.Meijo Univ., 2.Chiba Inst. Technol., 3.Gifu Univ.)

Keywords:high power impulse magnetron sputtering, energy resolved mass spectrometry

High power impulse magnetron sputtering discharge using a carbon target has attracted attention as a film formation technique to realize high-hardness and low-friction DLC film. In this study, the energy distributions of argon and carbon ions were measured using energy-resolved mass spectrometry. For argon ions, it consists of low energy and high energy components. On the other hand, for carbon ions, it consists of only high energy component.