Reduced-pressure firing of Ti-doped V<sub>2</sub>O<sub>5</sub> thin films fabricated by MOD

Hai VanNhu; Kohei Maeda; Masami Kawahara; Samura Tsuyoshi; Takashi Tachiki; Takashi Uchida

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Poster presentation

1 Interdisciplinary Physics and Related Areas of Science and Technology » 1.3 Novel technologies and interdisciplinary engineering

[17p-P2-1~10] 1.3 Novel technologies and interdisciplinary engineering

Sat. Mar 17, 2018 1:30 PM - 3:30 PM P2 (P)

1:30 PM - 3:30 PM

[17p-P2-4] Reduced-pressure firing of Ti-doped V₂O₅ thin films fabricated by MOD

〇(M1)Hai VanNhu¹, Kohei Maeda¹, Masami Kawahara², Samura Tsuyoshi², Takashi Tachiki¹, Takashi Uchida¹ (1.National Defense Academy, 2.Kojundo Chemical Lab)

Keywords:semiconductor, Vanadium, Titanium

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Presentation information

[17p-P2-1~10] 1.3 Novel technologies and interdisciplinary engineering

[17p-P2-4] Reduced-pressure firing of Ti-doped V2O5 thin films fabricated by MOD

[17p-P2-4] Reduced-pressure firing of Ti-doped V₂O₅ thin films fabricated by MOD