The 65h JSAP Spring Meeting, 2018

Presentation information

Oral presentation

21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[18a-E201-1~11] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Sun. Mar 18, 2018 9:00 AM - 12:15 PM E201 (57-201)

Toshiyuki Kawaharamura(Kochi Univ. of Tech.)

12:00 PM - 12:15 PM

[18a-E201-11] Bulk single crystal growth of a transparent conducting oxide InGaZnO4 using a floating-zone method under high air pressure

Yusuke Tanaka1, Fuji Takenori2, Wada Kazuhiro1, Shimizu Manato1, Hirochi Yusuke1, Kase Naoki1, Tamura Ryuji3, Saleem Denholme1, Kimizuka Noboru4, Miyakawa Nobuaki1 (1.Tokyo Univ. Sci., 2.Univ. Tokyo, 3.Tokyo Univ. Sci., 4.Sonora Univ.)

Keywords:IGZO, Large bulk single crystal growth, transparent conducting oxides

Transparent conducting oxides have been attracting attention for the next-generation transparent electrodes and (InGaO3)m(ZnO)n thin films have been actively studied. On the other hand, it has not been reported that a bulk single crystal is larger than ~μm size. However, large bulk single crystals of InGaZnO4 have been successfully grown using a floating zone method under high air pressure. we will report about its electrical- and optical- properties too.