2018年第65回応用物理学会春季学術講演会

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一般セッション(口頭講演)

13 半導体 » 13.7 化合物及びパワー電子デバイス・プロセス技術

[18p-C302-1~19] 13.7 化合物及びパワー電子デバイス・プロセス技術

2018年3月18日(日) 13:45 〜 19:00 C302 (52-302)

重川 直輝(大阪市立大)、佐藤 威友(北大)

18:30 〜 18:45

[18p-C302-18] Simulation of Heat Extraction from Ga2O3 MOSFETs with an Integrated SiC Heat Sink

ManHoi Wong1、Yoji Morikawa2、Masataka Higashiwaki1 (1.NICT、2.Silvaco Japan)

キーワード:Ga2O3, MOSFET, heat

Wide-bandgap β-Ga2O3 has attracted considerable interest for power electronics, but its low thermal conductivity of less than 30 W/m·K limits the performance and reliability of Ga2O3 devices. A common approach to address self-heating in high power transistors involves integrating active device layers with a thermally conductive foreign substrate for heat extraction. As a proof of concept, we performed electrothermal simulations in this work to demonstrate the effectiveness of polycrystalline SiC as a heat sink material for reducing the channel temperature and improving the DC characteristics of Ga2O3 power devices.