[19a-C101-1~10] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

▲ [19a-C101-7] Ar+ ion implantation used to reduce temperature for activating B atoms implanted in silicon

〇Keisuke Yasuta¹, Takuma Uehara¹, Masahiko Hasumi¹, Tomokazu Nagao², Yutaka Inouchi², Toshiyuki Sameshima¹ (1.TUAT, 2.NISSIN ION EQUIPMENT Co.)

Keywords:ion implantation, low temperature activation