[19p-P6-1~17] 6.4 Thin films and New materials

[19p-P6-3] Epitaxial growth of VO₂ films on SrTiO₃ substrates

〇Takeshi Kusumori¹, Setsuo Nakao¹ (1.AIST Chubu)

Keywords:pulsed-laser deposition, vanadium dioxide, epitaxy

Strontium titanate is one of the important materials for a development of oxide electronic devices. It has a peculiar characteristic of high-dielectric constant. It could be an advantage for application of vanadium dioxide devices such as field operating light switches and Mott transistors. Here we present a fabrication of epitaxially grown vanadium dioxide films on single crystal substrate of strontium titanate.