The 65h JSAP Spring Meeting, 2018

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[20a-B401-1~6] 7.3 Micro/Nano patterning and fabrication

Tue. Mar 20, 2018 10:30 AM - 12:00 PM B401 (53-401)

Jiro Yamamoto(HITACHI)

10:30 AM - 10:45 AM

[20a-B401-1] Fabrication of Linear Optical Fiber Arrays with Squared Fiber Ends for the Use of Matrix Projection Exposure

Toshiyuki Horiuchi1, Jun-ya Iwasaki1, Jun Watanabe1, Yuta Suzuki1 (1.Tokyo Denki Univ.)

Keywords:optical lithography, optical fiber array, projection exposure system

A new exposure system for the use of lithography for printing rough large patterns easily and inexpensively is under development. In the system, patterns are printed using a linear array of optical fibers with squared ends. Dark and bright distributions are given by injecting light to assigned fibers using light emitting diodes or laser proves, and arbitrary linear patterns are projected on a wafer coated with a resist film. For this reason, how to fabricate long linear arrays with squared ends accurately was investigated. As a result, 40 optical fibers with a nominal diameter of 500 μm were successfully squared in a line. Measured fiber sizes were 497±3 µm and 493±3µm in vertical and horizontal directions, respectively. Promising fiber arrays were obtained successfully.