〇Keisuke Takenaka¹, Masahiro Tsukamoto², Takahiro Ooga¹, Yuji Sato², Tsubasa Seike³, Minoru Yoshida³, Kensuke Murai⁴, Satoru Asai¹ (1.Grad.Sch of Eng., Osaka Univ., 2.JWRI, Osaka Univ., 3.Sci and Eng., Kindai Univ., 4.AIST Kansai)

1:15 PM - 1:30 PM

▲ [20p-B401-2] Fabrication of PDMS with 3D Microstructure for Antibacterial Antifouling Applications

〇Nithi Atthi¹, Preeyawis Na Ubol², Wisaroot Sripumkhai¹, Pattaraluck Pattamang¹, Rattanawan Meananeatra¹, Jakrapong Supadech¹, Wutthinan Jeamsaksiri¹, Charndet Hruanun¹ (1.Nat.Elec.&Com.Tech.Center, 2.Nat.Metal&Mat.Tech.Center)

1:30 PM - 1:45 PM

[20p-B401-3] Fabrication of strechable transparent electrode with jaggy structure using silver ink

〇(M2)Naoyuki Sato¹, Jun Taniguchi¹ (1.TUS)

1:45 PM - 2:00 PM

[20p-B401-4] Tough and antifouling antireflection structures made by partial filling UV-NIL

〇(M2)Hikari Eto¹, Shin Hiwasa², Jun Taniguchi¹ (1.TUS, 2.Autex Co., Ltd.)

2:00 PM - 2:15 PM

△ [20p-B401-5] Nanometer-Resolved Fluidity of an Oleophilic Monomer between Silica Surfaces Modified with a Reactive Adhesive Layer

〇Shunya Ito¹, Motohiro Kasuya¹, Kazue Kurihara², Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ., 2.NICHe, Tohoku Univ.)

2:15 PM - 2:30 PM

[20p-B401-6] Comparison of organic/inorganic hybridization of UV-cured resin films between exposure methods of an inorganic precursor

〇Takuya Uehara¹, Yuki Ozaki¹, Nobuya Hiroshiba¹, Takahiro Nakamura¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

2:45 PM - 3:00 PM

[20p-B401-7] UV nanoimprint lithography based on area-selective atomic layer deposition

〇Takuya Uehara¹, Yuki Ozaki¹, Nobuya Hiroshiba¹, Takahiro Nakamura¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

3:00 PM - 3:15 PM

[20p-B401-8] UV nanoimprint lithography involving a lift-off process for fabrication of Au split-ring nano-resonator arrays

〇Takuya Uehara^1,2, Giuseppe Calafiore², Scott Dhuey², Stefano Cabrini², Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ,, 2.Molecular Foundry, LBNL)

3:15 PM - 3:30 PM

△ [20p-B401-9] Fabrication of ultra-flat conductive thin films on atomically stepped polymer sheets

〇Shiori Yamada¹, Risa Goto¹, Taichiro Kinoshita¹, Kisho Nakamura¹, Satoru Kaneko^2,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech Univ., 2.KISTEC.)

3:30 PM - 3:45 PM

▲ [20p-B401-10] Direct Imprinting and Electrical Properties of ITO Precursor Gel

〇(D)Puneet Jain¹, Kenichi Haga¹, Eisuke Tokumitsu¹ (1.JAIST)

3:45 PM - 4:00 PM

[20p-B401-11] Study on profile correction for resist shrinkage in nanoimprint lithography

Tatsuya Iida¹, 〇Kenta Watanabe¹, Masaaki Yasuda¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

4:00 PM - 4:15 PM

[20p-B401-12] Investigation of a lift-off process in UV nanoimprint technology for copying of a thin-film-type aluminum power source showing photo-induced voltage

〇HARUNA YANO¹, MASARU NAKAGAWA¹ (1.IMRAM, Tohoku Univ.)

Sessions

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[20a-B401-1~6] 7.3 Micro/Nano patterning and fabrication

[20a-B401-1] Fabrication of Linear Optical Fiber Arrays with Squared Fiber Ends for the Use of Matrix Projection Exposure

[20a-B401-2] Evolutional OPC as DTCO : OPC Shot Counts Optimization on SPT Mask Technology

[20a-B401-3] Stochastic Simulation of Pattern Formation in Electron Beam Lithography

[20a-B401-4] Writing a grid pattern on the surface of the roll mold

[20a-B401-5] Coarse-grain molecular dynamics simulation of vertical lamellar phase of diblock copolymer in a thin film (2)

[20a-B401-6] Composite Nano-Structure on Si Surface using Nanosecond Pulsed Laser Irradiation

[20p-B401-1~12] 7.3 Micro/Nano patterning and fabrication

△ [20p-B401-1] Femtosecond laser formed nanostructures on PLA surface for control of cell elongation