[20a-B401-1~6] 7.3 Micro/Nano patterning and fabrication

[20a-B401-2] Evolutional OPC as DTCO : OPC Shot Counts Optimization on SPT Mask Technology

〇Kazuya Kadota¹ (1.Nanoscience Lab.)

Keywords:semiconductor, OPC, computational simulation

In this paper, when implementing the 16 nm node generation with the most general-purpose needs as one layer mask immersion lithography (SPT: Single Pattern Technology), mask data to be made larger and more complicated, and a longer drawing time of mask Layout design guidelines to deal with the problem were studied by computer simulation and mask drawing experiment.