[20a-B401-1~6] 7.3 Micro/Nano patterning and fabrication

[20a-B401-4] Writing a grid pattern on the surface of the roll mold

〇(M2)Yuta Takano¹, Jun Taniguchi¹ (1.TUS)

Keywords:Roll to Roll - Nanoimprint Lithography, Roll mold, Electron Beam Lithography

We developed a technology to directly expose the resin coated on the roll substrate with an electron beam while rotating the substrate. And we succeeded in fabricating dots and line & space patterns of 100 nm or less parallel to the direction of rotation. However, methods for writing lines perpendicular to the direction of rotation, which are necessary for complex patterns such as grid patterns, have not yet been demonstrated. In this study, we attempted to written grid pattern from two angles using electronic method and mechanical method.