Study on profile correction for resist shrinkage in nanoimprint lithography

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

Tue. Mar 20, 2018 1:00 PM - 4:15 PM B401 (53-401)

Toru Yamaguchi(NTT), Jun Taniguchi(Tokyo Univ. of Sci.)

3:45 PM - 4:00 PM

Tatsuya Iida¹, 〇Kenta Watanabe¹, Masaaki Yasuda¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

Keywords:nanoimprint lithography, mold, shrinkage