The 65h JSAP Spring Meeting, 2018

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[20p-B401-1~12] 7.3 Micro/Nano patterning and fabrication

Tue. Mar 20, 2018 1:00 PM - 4:15 PM B401 (53-401)

Toru Yamaguchi(NTT), Jun Taniguchi(Tokyo Univ. of Sci.)

3:30 PM - 3:45 PM

▲ [20p-B401-10] Direct Imprinting and Electrical Properties of ITO Precursor Gel

〇(D)Puneet Jain1, Kenichi Haga1, Eisuke Tokumitsu1 (1.JAIST)

Keywords:Direct thermal Imprinting, Indium Oxide

nano-Rehology (n-RP) is a direct thermal imprinting technique and deforms oxide precursor gel without photoresist. n-RP enables the deformation of sub-100 nm patterns by utilizing the rheological properties of an oxide precursor gel. In this work, we study how addition of tin (Sn) to pure indium oxide (In2O3), affects the direct imprinting and electrical properties of pure In2O3.