The 65h JSAP Spring Meeting, 2018

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7 Beam Technology and Nanofabrication » 7.5 Ion beams

[20a-B403-1~10] 7.5 Ion beams

Tue. Mar 20, 2018 9:00 AM - 11:45 AM B403 (53-403)

Toshio Seki(Kyoto Univ.), Junichi Yanagisawa(Univ. of Shiga Pref.)

10:30 AM - 10:45 AM

[20a-B403-6] Fabrication of 3D structure by double-angled etching with reactive gas cluster injection

〇Toshio Seki1, Hiroki Yamamoto2, Takahiro Kozawa3, Tadashi Syojo4, Kunihiko Koike4, Takaaki Aoki5, Jiro Matsuo1 (1.Graduate School of Engineering, Kyoto Univ., 2.QST, 3.ISIR Osaka Univ., 4.Iwatani Corp., 5.ACCMS, Kyoto Univ.)

Keywords:cluster, neutral beam, etching