The 65h JSAP Spring Meeting, 2018

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13 Semiconductors » 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[20a-C101-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

Tue. Mar 20, 2018 9:15 AM - 12:15 PM C101 (52-101)

Masato Sone(Titech)

9:15 AM - 9:30 AM

[20a-C101-1] [Young Scientist Presentation Award Speech] Electrical Properties of Nanowires Fabricated by the Electroless Deposition Process

〇Atsushi Hieno1, Tsutomu Nakanishi1, Yusuke Tanaka1 (1.Toshiba Memory Corp.)

Keywords:Electroless Deposition Process, Nanowire, Resistivity