The 65h JSAP Spring Meeting, 2018

Presentation information

Oral presentation

21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20p-E201-1~11] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Tue. Mar 20, 2018 1:00 PM - 4:00 PM E201 (57-201)

Takayoshi Oshima(Saga Univ.), Takeyoshi Onuma(Kogakuin Univ.)

3:30 PM - 3:45 PM

[20p-E201-10] β-(Ga1-yScy)2O3 as a novel wide band-gap semiconductor alloy

Ryo Wakabayashi1, Kohei Yoshimatsu1, Akira Ohtomo1,2 (1.Tokyo Tech., Dept. Chem. Sci. Eng., 2.MCES)

Keywords:Ga2O3, alloy, Epitaxial growth

四元系混晶半導体β-(AlxGa1-x-yScy)2O3は,その固溶量を制御することでβ-Ga2O3への完全格子整合が期待できる.今回我々は四元系混晶半導体薄膜の成長に向け,β-(Ga1-yScy)2O3薄膜の成長を行った.得られた薄膜はβ-gallia型構造を有し,またSc組成に応じてバンドギャップが5.01 eV (y ~ 0.2)まで増加することを確認した.