The 80th JSAP Autumn Meeting 2019

Hojun Kang

→ Search for Hojun Kang in Google Scholar

Speaker, Author, Co-Author

Wed. Sep 18, 2019 9:00 AM - 12:00 PM C309 (C309)

  • Oral presentation
  • | 8 Plasma Electronics
  • | 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-C309-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

11:00 AM - 11:15 AM

△ [18a-C309-7] Surface modification of Y2O3 by F+ ion irradiation

〇(M1)Hojun Kang1, Tomoko Ito1, Junghwan Um2, Hikaru Kokura2, Taekyun Kang2, Sungil Cho2, Hyunjung Park2, Michiro Isobe1, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (1.Center for Atomic and Molecular Technologies, Graduate School of Enginerring, Osaka Univ, 2.Memory Etch Technology Team, Samsung Electronics)