Hojun Kang

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 9:00 AM - 12:00 PM C309 (C309)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-C309-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

11:00 AM - 11:15 AM

△ [18a-C309-7] Surface modification of Y₂O₃ by F⁺ ion irradiation

〇(M1)Hojun Kang¹, Tomoko Ito¹, Junghwan Um², Hikaru Kokura², Taekyun Kang², Sungil Cho², Hyunjung Park², Michiro Isobe¹, Kazuhiro Karahashi¹, Satoshi Hamaguchi¹ (1.Center for Atomic and Molecular Technologies, Graduate School of Enginerring, Osaka Univ, 2.Memory Etch Technology Team, Samsung Electronics)