Koji Aihara

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 9:45 AM - 12:00 PM F211 (F211)

Oral presentation
| 8 Plasma Electronics
| 8.3 Plasma nanotechnology

[18a-F211-1~8] 8.3 Plasma nanotechnology

11:45 AM - 12:00 PM

△ [18a-F211-8] Fabrication of Metal-doped SiO:CH Films by CCP-CVD/Sputtering Hybrid Process

〇(B)Koji Aihara², Masahiro Kanno¹, Mamoru Yazaki¹, Yasushi Inoue^1,2, Osamu Takai³ (1.Chiba Inst Tech Grad, 2.Chiba Inst Technol, 3.Kanto-Gakuin Univ)

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