CheolMin Lim

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 1:15 PM - 5:00 PM B11 (B11)

Oral presentation
| 13 Semiconductors
| 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[18p-B11-1~14] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

3:30 PM - 3:45 PM

▼ [18p-B11-9] Influence of hydrogen ion implantation dose on characteristics of Ge-on-insulator substrates fabricated by smart-cut technology

〇CheolMin Lim¹, Ziqiang Zhao¹, Kei Sumita¹, Kasidit Toprasertpong¹, Mitsuru Takenaka¹, Shinichi Takagi¹ (1.Univ. of Tokyo)