Masayuki Nakamura

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 1:45 PM - 5:15 PM C309 (C309)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18p-C309-1~13] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:30 PM - 4:45 PM

△ [18p-C309-11] The behavior of ions in TiN sputtering plasma using high power impulse magnetron sputtering

〇(M2)Masayuki Nakamura¹, Keigo Takeda¹, Takayuki Ohta¹ (1.Meijo Univ.)