Kazufumi Hata

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 1:45 PM - 5:15 PM C309 (C309)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18p-C309-1~13] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:45 PM - 3:00 PM

△ [18p-C309-5] Pressure dependence of polycrystalline diamond film deposition using
time-series exposure of modulated and non-modulated Ar/CH₄/H₂ induction thermal plasmas.

〇(M1)Kazufumi Hata¹, Kano Naoki¹, Nakano Yusuke¹, Tanaka Yasunori¹, Uesugi Yoshihiko¹, Ishijima Tatsuo¹ (1.Kanazawa Univ.)