Rahul Agrawal

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 4:00 PM - 6:00 PM PB2 (PB)

Poster presentation
| 13 Semiconductors
| 13.3 Insulator technology

[18p-PB2-1~4] 13.3 Insulator technology

4:00 PM - 6:00 PM

▲ [18p-PB2-2] The effect of Hf-ion implantation on the charge trapping characteristics of MONOS-type memory devices

〇(M1)Rahul Agrawal¹, Kiyoteru Kobayashi¹ (1.Tokai Univ.)