Kenta Sugawara

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Speaker, Author, Co-Author

Fri. Sep 20, 2019 1:30 PM - 5:35 PM E301 (E301)

Symposium (Oral)
| Symposium (technical)
| Etching Technology for Nitride Semiconductors: recent progress in high-controllable and low-damaging process

[20p-E301-1~9] Etching Technology for Nitride Semiconductors: recent progress in high-controllable and low-damaging process

4:50 PM - 5:20 PM

[20p-E301-8] Reliability Improvement of GaN HEMT by Chlorine Neutral Beam Etching

〇Kenta Sugawara¹, Masaya Okada¹, Hiroyuki Ichikawa¹, Kazutaka Inoue¹, Daisuke Ohori², Seiji Samukawa^2,3 (1.Sumitomo Electric Industries, Ltd., 2.IFS, Tohoku Univ., 3.AIMR, Tohoku Univ.)

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