Ryota Sakamoto

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Speaker, Author, Co-Author

Fri. Sep 20, 2019 1:15 PM - 7:00 PM E310 (E310)

Oral presentation
| 15 Crystal Engineering
| 15.4 III-V-group nitride crystals

[20p-E310-1~21] 15.4 III-V-group nitride crystals

1:45 PM - 2:00 PM

[20p-E310-3] Improvement of surface flatness using H₂ etching in N-polar AlN

〇Ryota Sakamoto¹, Tatuya Isono¹, Tadatoshi Ito¹, Kazuya Ataka², Hiroshi Kawamura², Narihito Okada¹, Kazuyuki Tadatomo¹ (1.Grad.School of Sci., 2.Department of Eng,Yamaguchi Univ.)