Kazuya Nakane

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Speaker, Author, Co-Author

Fri. Sep 20, 2019 1:30 PM - 5:45 PM N304 (N304)

Symposium (Oral)
| Symposium (technical)
| Latest trend on atomic layer processes

[20p-N304-1~10] Latest trend on atomic layer processes

5:15 PM - 5:30 PM

△ [20p-N304-9] In-situ etching reaction analysis of silicon nitride in ALE by fluorine radicals

〇Kazuya Nakane¹, Rene H. J. Vervuurt^2,3, Takayoshi Tsutsumi³, Nobuyoshi Kobayashi³, Masaru Hori³ (1.Nagoya Univ. Eng., 2.ASM Japan K.K., 3.Center for Low-temperature Plasma Sciences, Nagoya univ.)

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