Oral presentation

16 Amorphous and Microcrystalline Materials » 16.3 Bulk, thin-film and other silicon-based solar cells

[20p-E314-1~14] 16.3 Bulk, thin-film and other silicon-based solar cells

Fri. Sep 20, 2019 1:30 PM - 5:15 PM E314 (E314)

Mitsuhiro Matsumoto(Panasonic), Ryosuke Ishikawa(Tokyo City Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 1:45 PM

[20p-E314-1] Evaluation of RPD defects by DLTS

〇(M2)Tomohiko Hara¹, Riku Wakita¹, Yuki Isogai¹, Takefumi Kamioka^1,2, Yoshio Ohshita¹ (1.Toyota Technol Inst., 2.Meiji Univ.)

1:45 PM - 2:00 PM

[20p-E314-2] Evaluation of passivation of oxidized Si using LTEM and corona charging

〇Toshimitsu Mochizuki¹, Akira Ito², Katsuto Tanahashi¹, Hidetoshi Nakanishi², Iwao Kawayama³, Masayoshi Tonouchi³, Katsuhiko Shirasawa¹, Hidetaka Takato¹ (1.AIST, 2.SCREEN, 3.ILE, Osaka Univ.)

2:00 PM - 2:15 PM

[20p-E314-3] Silicon Heterojunction Solar Cells Analyzed by Atom Probe Tomography

〇Yasuo Shimizu¹, Bin Han¹, Naoki Ebisawa¹, Yoshinari Ichihashi², Taiki Hashiguchi², Hirotaka Katayama², Mitsuhiro Matsumoto², Akira Terakawa², Koji Inoue¹, Yasuyoshi Nagai¹ (1.IMR Tohoku Univ., 2.Panasonic Corp.)

2:15 PM - 2:30 PM

[20p-E314-4] Plasma process induced damage evaluation in Si substrate for solar cells

〇(M2)Kouhei Onishi¹, Hara Yutaka¹, Nishihara Tappei¹, Kanai Hiroki¹, Kamioka Takefumi¹, Ohshita Yoshio², Ogura Atsushi¹ (1.Meiji Univ., 2.Toyota Tech. Inst.)

2:30 PM - 2:45 PM

△ [20p-E314-5] Evaluation of the process damage induced by sputtering deposition of transparent conductive oxide film.

〇Hiroki Kanai¹, Tappei Nishihara¹, Takehumi Kamioka¹, Junsuke Matsuzaki², Hirohisa Takahashi², Junya Kiyota², Satoshi Yasuno³, Ichiro Hirosawa³, Atsushi Ogura¹ (1.Meiji Univ., 2.ULVAC, 3.JASRI)

2:45 PM - 3:00 PM

[20p-E314-6] Deposition of high quality i-a-Si:H film by facing target sputtering and its application to silicon heterojunction solar cell

〇Yuta Shiratori^1,2, Shinsuke Miyajima¹ (1.Tokyo Tech., 2.JSPS research fellow)

3:00 PM - 3:15 PM

[20p-E314-7] Applying for ITO deposition on a-Si:H passivating layer
using four targets facing sputtering cathode and its effect

〇Hiroshi Iwata¹ (1.Keihin Ramtech)

3:30 PM - 3:45 PM

▲ [20p-E314-8] Microparticle-Assisted Texturing (MPAT) Process: Almost One Order Cost-Reduction, and Toward Mass Production of Low-Cost and High-Performance Crystalline-Silicon Solar Cells

〇(PC)Cong Thanh Nguyen¹, Keisuke Ohdaira¹, Hideki Matsumura¹ (1.Japan Advanced Institute of Science and Technology (JAIST))

3:45 PM - 4:00 PM

[20p-E314-9] Fabrication of SHJ solar cells with p-type a-Si films formed by B Cat-doping

〇Taiyo Tsurugai¹, Ohdaira Keisuke¹ (1.JAIST)

4:00 PM - 4:15 PM

[20p-E314-10] Passivation Quality of a-Si_1-xO_x:H Thin Film on Textured Substrates

〇Kimihiko Saito¹, Tsukasa Takamura², Yukimi Ichikawa², Makoto Konagai² (1.Fukushima Univ., 2.Tokyo City Univ.)

4:15 PM - 4:30 PM

[20p-E314-11] Improvement of Textured Rib-Si Solar Cells

〇Tsukasa Takamura¹, Ryuto Iwata¹, Yukimi Ichikawa¹, Kimihiko Saito², Makoto Konagai¹ (1.Tokyo City Univ., 2.Fukushima Univ.)

4:30 PM - 4:45 PM

[20p-E314-12] Improvement of Characteristics of Amorphous Si Quintuple-Junction Solar Cells under Low Illuminance

〇Makoto Konagai¹, Ryo Sasaki¹, Momoka Yonemura¹, Ryousuke Ishikawa¹ (1.Tokyo City Univ.)

4:45 PM - 5:00 PM

[20p-E314-13] Discussion on Proton-Induced Three Center Bond and Photodegradation

〇Yasutake Toyoshima¹ (1.RENRC AIST)

5:00 PM - 5:15 PM

[20p-E314-14] Measurement of Photo-Current Spectrum in Si/SiO₂ Superlattice by FTPS

〇(M1)Nishi Yuki¹, Takumi Nakagawa¹, Yuto Ebata¹, Nur Syazwana Abd Rahman¹, Shigeru Yamada¹, Takashi Itoh¹ (1.Gifu Univ.)

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