The 80th JSAP Autumn Meeting 2019

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Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-C309-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Wed. Sep 18, 2019 9:00 AM - 12:00 PM C309 (C309)

Keiichiro Urabe(Kyoto Univ.), Takayoshi Tsutsumi(名大)

9:45 AM - 10:00 AM

[18a-C309-4] Thermal etching reactions of acetylacetone with transition metals

〇Tomoko Ito1, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (1.Osaka Univ.)

Keywords:Atomic layer etching, transition metal