[18a-C309-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-C309-3] Cyclic Etching of Cobalt via Oxide and Organometallic Complex

〇Sumiko Fujisaki¹, Yoshihide Yamaguchi¹, Hiroyuki Kobayashi¹, Kazunori Shinoda¹, Masaki Yamada¹, Hirotaka Hamamura¹, Kohei Kawamura², Hiroto Otake², Masaeu Izawa² (1.Hitachi R&D, 2.Hitachi High-Tech)

Keywords:etching, organometallic complex, cobalt