The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-C309-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Wed. Sep 18, 2019 9:00 AM - 12:00 PM C309 (C309)

Keiichiro Urabe(Kyoto Univ.), Takayoshi Tsutsumi(名大)

9:15 AM - 9:30 AM

[18a-C309-2] Development of bio-template arrangement equipment for realizing mask-less defect-free fabrication

MIKIO KADOI1, MASAHISA ISHIDA2, MAMI TANAKA2, MASAHIRO SOTA2, DAISUKE OHORI3, SHUICHI NODA4, YOSHIYUKI NOZAWA5, BRIAN RIAO5, RYOSUKE FUJII5, TOSHIYASU HAYAMI5, KAZUHIKO ENDO4, SEIJI SAMUKAWA3 (1.LTJ Corp., 2.NAGASE & CO., LTD., 3.IFS, Tohoku Univ., 4.AIST, 5.SPT Co., Ltd.)

Keywords:nano-sized quantum dots, ferritin, maskless etching

When processing of nano-sized quantum dots is realized, it becomes possible to manufacture solar cells, thermoelectric conversion elements, etc. at low cost, which greatly contributes to the realization of elements for IoT applications having a highly efficient power generation function as an environmental power source. In this research and development, we have developed a bio-template formation device that utilizes the self-orientation of a ferritin protein that includes a nano-sized iron core that can be a maskless etching mask that can form a nanostructure without using expensive photolithography.