Development of neutral beam etching equipment for realizing mask-less defect-free fabrication

Yoshiyuki Nozawa; Liao Bryan; Ryosuke Fujii; Toshihiro Hayami; Daisuke Ohori; Shuichi Noda; Mikio Kadoi; Teruhisa Ishida; Mami Tanaka; Masahiro Sota; Kazuhiko Endo; Seiji Samukawa

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-C309-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Wed. Sep 18, 2019 9:00 AM - 12:00 PM C309 (C309)

Keiichiro Urabe(Kyoto Univ.), Takayoshi Tsutsumi(名大)

9:00 AM - 9:15 AM

[18a-C309-1] Development of neutral beam etching equipment for realizing mask-less defect-free fabrication

〇Yoshiyuki Nozawa¹, Liao Bryan¹, Ryosuke Fujii¹, Toshihiro Hayami¹, Daisuke Ohori², Shuichi Noda³, Mikio Kadoi⁴, Teruhisa Ishida⁵, Mami Tanaka⁵, Masahiro Sota⁵, Kazuhiko Endo³, Seiji Samukawa² (1.SPT Co., Ltd., 2.IFS, Tohoku Univ., 3.AIST, 4.LTJ Corp., 5.NAGASE & CO., LTD.)

Keywords:neutral beam, etching, defect-free

Development of neutral beam etching equipment for realizing mask-less defect-free fabrication