The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-C309-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Wed. Sep 18, 2019 9:00 AM - 12:00 PM C309 (C309)

Keiichiro Urabe(Kyoto Univ.), Takayoshi Tsutsumi(名大)

10:45 AM - 11:00 AM

[18a-C309-6] Potential structure analysis of a capillary plate in a dual frequency CCP

〇(D)Makato Moriyama1, Akihiro Mitsuya1, Naoya Nakahara1, Haruka Suzuki1, Hirotaka Toyoda1 (1.Nagoya Univ.)

Keywords:Dual frequency CCP, Spatial potential structure