[18a-E303-1~12] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

△ [18a-E303-11] Chemical bond state evaluation at buried interface by laboratory HAXPES method

〇Tappei Nishihara¹, Hiroki Kanai¹, Ryo Yokogawa^1,2, Ichiro Hirosawa³, Satoshi Yasuno³, Toshiro Okawa⁴, Atsushi Ogura¹ (1.Meiji Univ., 2.JSPS Research Fellow DC, 3.JASRI, 4.Scienta Omicron)

Keywords:XPS, Hard X-ray, Synchrotron

In recent years, a laboratory-based equipment for hard X-ray photoelectron spectroscopy, which has attracted much attention, has been developed, and measurement results using it are reported. We will report the details of the device performance using Au, SiO₂/Si structure sample, and the influence of the TiN/Si structure TiN film thickness on the measurement results.