The 80th JSAP Autumn Meeting 2019

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Oral presentation

8 Plasma Electronics » 8.3 Plasma nanotechnology

[18a-F211-1~8] 8.3 Plasma nanotechnology

Wed. Sep 18, 2019 9:45 AM - 12:00 PM F211 (F211)

Keigo Takeda(Meijo Univ.), Kunihiro Kamataki(Kyushu Univ.)

11:45 AM - 12:00 PM

△ [18a-F211-8] Fabrication of Metal-doped SiO:CH Films by CCP-CVD/Sputtering Hybrid Process

〇(B)Koji Aihara2, Masahiro Kanno1, Mamoru Yazaki1, Yasushi Inoue1,2, Osamu Takai3 (1.Chiba Inst Tech Grad, 2.Chiba Inst Technol, 3.Kanto-Gakuin Univ)

Keywords:CCP-CVD, Magnetron sputtering, SiO:CH Films