〇(B)Koji Aihara², Masahiro Kanno¹, Mamoru Yazaki¹, Yasushi Inoue^1,2, Osamu Takai³ (1.Chiba Inst Tech Grad, 2.Chiba Inst Technol, 3.Kanto-Gakuin Univ)

Poster presentation

[20a-PA5-1~2] 8.3 Plasma nanotechnology

Fri. Sep 20, 2019 9:30 AM - 11:30 AM PA5 (PA)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:30 AM - 11:30 AM

[20a-PA5-1] Influences of Substrate Surface Morphology on Isolated Nano-columnar Structures Synthesized by Glancing-angle Sputtering

〇Masahiro Homma¹, Masashi Hosoya¹, Yasushi Inoue¹, Osamu Takai² (1.Chiba Inst. Technol., 2.Kanto Gakuin Univ.)

9:30 AM - 11:30 AM

[20a-PA5-2] Fabrication of InAlN Films by Reactive Sputtering and Reactive Evaporation with Glancing-angle Deposition Scheme

〇Yoshiyuki Nakayama¹, Daisuke Hoshi¹, Yasushi Inoue¹, Osamu Takai² (1.Chiba Inst. Technol, 2.Kanto Gakuin Univ.)

Sessions

8 Plasma Electronics » 8.3 Plasma nanotechnology

[18a-F211-1~8] 8.3 Plasma nanotechnology

[18a-F211-1] [Young Scientist Presentation Award Speech] Continuous Growth of Silicon Nanorods by Plasma Flash Evaporation and Their Lithium-ion Battery Anode Feasibilities

[18a-F211-2] Formation path of Li-La-Zr-O solid electrolyte by plasma flash evaporation

[18a-F211-3] Study of Carbon Nanotube Spinning Process Using Gas Discharge Breakdown

[18a-F211-4] Spatio-temporal Information Analysis of Fluctuation of Growth of Nanoparticles in Amplitude Modulated Reactive Plasma

△ [18a-F211-5] Synthesis of zinc oxide thin film by radical assisted mist CVD using atmospheric pressure plasma jet

[18a-F211-6] Fabrication of carbon nanowalls with large interspace between adjacent walls using solution posttreatment

[18a-F211-7] Au nanoparticles synthesis on the surface of SWNTs by atmospheric-pressure plasma reduction

△ [18a-F211-8] Fabrication of Metal-doped SiO:CH Films by CCP-CVD/Sputtering Hybrid Process

[20a-PA5-1~2] 8.3 Plasma nanotechnology

[20a-PA5-1] Influences of Substrate Surface Morphology on Isolated Nano-columnar Structures Synthesized by Glancing-angle Sputtering

[20a-PA5-2] Fabrication of InAlN Films by Reactive Sputtering and Reactive Evaporation with Glancing-angle Deposition Scheme

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